Examples of using Sputtering target in English and their translations into Norwegian
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Colloquial
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Ecclesiastic
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Ecclesiastic
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Computer
What is a sputtering target.
high density of a sputtering target.
CXMET is one of the best China Types of sputtering target in CXMET manufacturers
We produce high purity titanium sputtering target, titanium arc cathode,
Typically, the sputtering target is a polycrystalline structure having a grain size on the order of a few microns to millimeters.
High purity sputtering target, arc cathode can be customed in any shape
The titanium nitride sputtering target is made of titanium nitride and has a chemical formula of TiN,
handling in any way, the sputtering target must be wrapped in protective paper and a layer of foam.
Following the client's need, we supply also a large range of sputtering target in various materials and dimensions.
The rate of growth from 100% to 65% of the sputtering target is less than expected, only increasing by about 10%.
In wafer manufacturing material, sputtering target materials chip manufacturing accounted for about 2.6% of the market.
Sputtering target for magnetron sputtering,
The use of magnetic field magnetron sputtering target plasma enhanced ion bombardment in front,
include sputtering target, evaporation material,
Strictly speaking, the range of sputtering target to be smaller, but in practical application, usually called all target sputtering target.
we have zirconium round surface coating sputtering target in stock for you.
we have Types of sputtering target in CXMET in stock for you.
Need not decompose under the condition of almost any metal materials can be used as a sputtering target.
My factory have a serious of equipment to process forgings, sputtering target is the mainly one.
nickel oxide ceramic target sputtering target.