The amount of high-purity gases used in production of electronic materials and parts is expected to continue increasing due to the progress in miniaturization and multilayer structures of semiconductor integrated circuits and the development of LCDs toward higher definition.
Large cost benefit, no performance penalty The barrier to NOR Flash scaling beyond the 45nm node means that automotive system manufacturers will face a huge bill-of-materials cost penalty if they decide to meet the requirement for increased code storage capacity in new applications with expensive SPI NOR Flash devices.
The barrier to NOR Flash scaling beyond the 45nm node means that automotive system manufacturers will face a huge bill-of-materials cost penalty if they decide to meet the requirement for increased code storage capacity in new applications with expensive SPI NOR Flash devices.
Although conditions worsened for end products, such as semiconductor-related goods, in the Information Technology business, we saw steady profit growth due to the expansion of market share for glass disk substrates for data center HDDs, on top of timely responses to R&D demand for mask blanks for EUV(Extreme Ultraviolet) lithography, which is a nextgeneration semiconductor miniaturization technology.
As a result of miniaturized and highly integrate semiconductors, TRL will operate as an information gathering and marketing base for new product creation in order to respond to the demand for high purification of chemical and materials received from semiconductor manufacturers. TRL will also play a role as a development base that will conduct joint development with semiconductor manufacturers and research institutes.
Device miniaturization With the further miniaturization of semiconductor devices in recent years, greater precision and higher productivity in ultra-shallow junction formation are in huge demand.
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