英語 での Ultrapure water の使用例とその 日本語 への翻訳
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The space-saving system located in the training laboratory produces up to two liters of ultrapure water per minute.
Ideal for existing tool installations, it easily fits into existing exhaust lines and requires only power and ultrapure water connections.
We have Class 10, Class 100 and Class 1000 clean rooms, ultrapure water equipment, and various measuring instruments, and can propose a wide variety of cleaning processes through tests and demonstrations.
With an ultrapure water supply contract, Kurita builds and owns the facilities inside the factories of customers, and provides a total package of services that include operation, management, and maintenance, supplying customers with the ultrapure water they demand.
In recent years, due to the rapid miniaturization of semiconductors and simultaneous increase in capacity, it has become necessary to further boost the purity of the ultrapure water used in the cutting-edge semiconductor and wafer manufacturing processes.
Seeking to meet the growing need related to the miniaturization and increasingly larger capacity of electronic devices, Kurita has pursued technology to remove impurities to the maximum in order to increase the purity of ultrapure water.
Low volatile grade silicone suitable for pharmaceutical, biomedical, cosmetic, and food applications such as ultrapure water transfer, food processing, skid systems, and other suction and discharge uses.
In ultrapure water applications, Our UV systems are used for the effective reduction of organics, commonly referred to as TOC otherwise known as Total Oxidizable Carbon.
Tokyo, Japan- DIC Corporation has developed a hollow fiber membrane decarbonation module that extends the life of ion-exchange resins used in the production of pure and ultrapure water.
Of all the diverse end-user demands regarding water quality, ultrapure water has the highest standards and requirements in terms of particle control, system purity and quality assurance.
The cutting-edge manufacturing techniques for 32-nm Class or later semiconductor devices, in particular, require stabilized ultrapure water with a metallic ion concentration level of 0.1 ppt or less, as an indispensable prerequisite.
The basic procedure is to convert the electricity, ultrapure water, exhaust and other utility use into an energy equivalent(kWh) to enable the calculation of the total energy use.
With the industry's leading delivery track record, and supported by a wealth of past data, Organo's closed system turns recovered water into high quality ultrapure water.
The electric resistivity ratio of theoretically pure water is 18.24 MΩcm, and ultrapure water has been made as close as possible to this level.
Semiconductor manufacturing and nuclear power station cleaning processes require ultrapure water, from which impurities have been removed to the maximum extent.
Early detection of trace contamination is enabled with minimal operator supervision. Ultrapure water monitoring at sub-ppb sodium levels can assure the highest quality water is delivered.
This system was developed by applying Kurita Continuous Deionization(CDI)* technology, which Kurita has accumulated over many years in the ultrapure water field, and adding a new function allowing the selective separation of ions contained in the solutions and waste liquids.
RO membranes are used for a wide range of purposes, including ultrapure water production systems, which are required to manufacture semiconductors and liquid crystal, and desalination plants used to render seawater drinkable, as well as recovering and reclaiming industrial wastewater.
These needs from our clients for higher purification and quality stability have also presented us with the challenge of improving the quality of ion-exchange resins and UF membranes, which are key components for ultrapure water production systems.
Compact Aluminum die-cast Exia II CT4X explosion-proofing standard, IP65-compliant Wide measurement range from ultrapure water to plant waste water Sensor supporting a wide range of applications Meas. range Minimum 0 to 0.2000μS/cm Maximum 0 to 20.00mS/cm.