Examples of using Etching in English and their translations into Bengali
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Colloquial
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Ecclesiastic
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Computer
Custom RFID Etching Antenna.
The paddle speed and starting temperature should be adjusted according to the variety of the sidewall in the following etching process.
What's more, the products with the AL etching that can be extreme thin,
And then, the magnesium etching plate was adopt in some upscale and welcomed widely while the packing and painting industry developed soon.
We have advanced ultrasonic technology, and aluminum(AL) etching techniques, so the quality of our products is stable also durable and better Reading and writing performance.
The yarn subjected to high temperature etching is ablated, the dye is vaporized, and different depths of etching are formed to produce a pattern or other washing effect.
The etching of silicon dioxide film has the advantages of fast etching speed and good selectivity.
In a number of modern variants such as microfabrication etching and photochemical milling it is a crucial technique in much modern technology, including circuit boards.
electroplated machine, etching and sandblasting machines.
After etching, wash the plate with water or tri-sodium phosphate aqueous solution, then dry it.
Blast media and blasting abrasives are used to provide surface texturing and preparation, etching, finishing and degreasing.
The use of conductive ink to print the antenna instead of the traditional etching method to make the antenna in the electronic tag reduces the manufacturing cost of the RFID electronic tag.
The etching pattern supposedly makes the glass feel more like paper,
Pressure, unlike etching or lithography, and it does not have to be planar.
electronic industrial plasma chemical etching agent and fluoride compounds.
The chemical inertness of ceramics allows those components to be contamination-free for the wafer in particular in chemical wet etching baths.
to make customized products, package and printing/ etching logo.
Plasma etching gases for microelectronics industry The etching of silicon dioxide film has the advantages of fast etching speed and good selectivity.
It can be used for selective etching of metal silicides and oxides versus their metal substrates and also for etching of silicon dioxide over silicon.
All the flexible components of the rigid flex assembly have completely different handling, etching and soldering processes than rigid FR4 boards.